通过改变一个薄电介质层的折射率来研究其对金属电介质金属光子晶体（M-D-MPhC）强透射特性的影响。采用与CMOS工艺兼容技术制作了由折射率分别为[nd（SU-8）=1.6,nd（SiO2.1N0.3）=1.6和nd（SiO0.6N1）=1.8]组成的三个正方形晶格圆孔阵列M-D-MPhC结构，利用傅里叶变换红外光谱仪测量其透射光谱。实验结果发现，金SiO2.1N0.3金结构能够获得较强的光透射增强效果和较窄的透射峰，证明了M-D-MPhC强透射特性既与中间电介质折射率大小有关，又与其材料制作工艺差异有关。采用时域有限差分（FDTD）法模拟了在相同条件下折射率分别为1.6和1.8组成的M-D-MPhC透射光谱和电场强度密度分布，模拟结果较好地符合了实验发现。

The effect of refractive index on extraordinary transmission properties for metal-dielectric-metal photonic crystal (M-D-MPhC) by changing a thin dielectric layer is studied. Three M-D-MPhC structures combined with square lattice round holes array with different refractive indexes [nd（SU-8）=1.6, nd（SiO2.1N0.3）=1.6 and nd（SiO0.6N1)=1.8] are fabricated using compatible technology with CMOS process, and their transmission spectra are measured using Fourier transform infrared spectrometer. It is found that Au-SiO2.1N0.3-Au structure can obtain better effect of light transmission enhancement and narrower transmission peak in experimental results. It is demonstrated that extraordinary transmission properties for M-D-MPhC depend strongly on both the size of refractive index of middle dielectric and its material fabrication process difference. The finite-difference time-domain (FDTD) method is used to simulate transmission spectra and electric field intensity density distribution of M-D-MPhC with refractive index of 1.6 and 1.8 respectively under the same conditions. Simulation results agree well with the experimental findings.