强激光与粒子束, 2012, 24 (6): 1276, 网络出版: 2012-06-06
SiO2/HfO2高反射膜的研制
Preparation of SiO2/HfO2 high reflectors
应力 面形 吸收 节瘤缺陷 预处理 激光损伤 stress surface flatness absorption nodular defects laser conditioning laser induced damage
摘要
主要讨论了电子束蒸发SiO2/HfO2薄膜的面形控制和损伤性能。研究了电子束蒸发工艺参数对薄膜应力以及面形的影响；分析了制备工艺对薄膜吸收、节瘤缺陷密度的影响，测量了制备薄膜的损伤阈值。研究结果表明：调整SiO2蒸发时的氧分压可以有效地将薄膜的应力控制在-250~-50 MPa。同时采用金属Hf蒸发可以显著地将节瘤缺陷密度从12.6 mm-2降低至2.7 mm-2，同时将损伤阈值从30 J/cm2提高至55 J/cm2。
Abstract
The paper mainly discusses how to control the surface flatness and to improve the laser induced damage threshold(LIDT) of electron-beam evaporated SiO2/HfO2 high reflectors. The deposition parameters were optimized to control the film stress and wavefront distortion, and to reduce the film absorption, to decrease the defect density. The LIDT of the prepared films was also measured. The experimental results show that adjusting the pressure during SiO2 evaporation can control the film stress within the range of -250 to -50 MPa. Using hafnium and silica as starting materials can reduce the defect density from 12.6 to 2.7 mm-2 and increase the LIDT from 30 to 55 J/cm2.
程鑫彬, 沈正祥, 焦宏飞, 马彬, 张锦龙, 丁涛, 王占山. SiO2/HfO2高反射膜的研制[J]. 强激光与粒子束, 2012, 24(6): 1276. Cheng Xinbin, Shen Zhengxiang, Jiao Hongfei, Ma Bin, Zhang Jinlong, Ding Tao, Wang Zhanshan. Preparation of SiO2/HfO2 high reflectors[J]. High Power Laser and Particle Beams, 2012, 24(6): 1276.
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