利用HF蚀刻和热处理，结合原子力显微(AFM)分析，对传统抛光和磁流变抛光的表面结构进行了表征。为了分析热处理凸起的形成源，抛光表面在热处理前分别采用超声清洗、化学沥滤和HF蚀刻三种不同的表面处理技术进行处理，去除了不同表面材料。蚀刻形貌和热处理形貌及其关联性表明，传统抛光表面存在着大量纳米级缺陷，这些缺陷由易于诱导激光损伤的纳米级微裂纹和颗粒状分布的抛光杂质组成。结合抛光机制的分析，建立了传统抛光表面的微裂纹颗粒杂质结构模型。

The surface structure features of conventional polished and magneto-rheological finishing (MRF) polished fused silica are characterized by HF based etching and thermal treating combined with atomic force microscopy (AFM). To analyze the source of thermal treating bulges, the polished surfaces are treated by three different surface treatments, namely, ultrasonic cleaning, chemical leaching, and HF etching to remove different materials on/in surface. The surface morphology after etching or thermal treating and their correlations show that there existe high-density nanoscale defects in conventional polished surface. These subsurface defects are composed of nanoscale micro-cracks and grainy impurities, which are easy to induce laser damage. Herein, a micro-cracks and grainy impurities structure model about conventional polished surface is proposed based on the analysis of material removal mechanism of polishing.