光学学报, 2012, 32 (10): 1031004, 网络出版: 2012-07-17
多晶氧化物薄膜及复合膜系应力模型
Model of Stress Evolution in Polycrystalline Oxide and Composite Thin Films
薄膜 应力模型 多晶膜 复合膜 应力演化 thin films stress model polycrystalline thin films composite films stress evolution
摘要
基于膜层结构的弛豫现象,建立了一个多晶膜的应力演化模型,并通过线性组合给出了复合膜的生长应力模型。利用双光束基底曲率测量装置实时测量了电子束蒸发氧化铪、氧化硅多晶膜及其复合膜的应力演化过程,并对测量结果进行了拟合分析。
Abstract
A model in terms of relaxation process of film structure is developed for stress evolution in polycrystalline thin films. And the growth stress model of composite films is given by linear combination. HfO2 film, SiO2 film and a composite film are prepared by electron-beam evaporation. And stress evolution is obtained by in situ wafer curvature measurement. All experimental results are analyzed through model fitting.
李静平, 方明, 贺洪波, 邵建达, 范正修, 李朝阳. 多晶氧化物薄膜及复合膜系应力模型[J]. 光学学报, 2012, 32(10): 1031004. Li Jingping, Fang Ming, He Hongbo, Shao Jianda, Fan Zhengxiu, Li Zhaoyang. Model of Stress Evolution in Polycrystalline Oxide and Composite Thin Films[J]. Acta Optica Sinica, 2012, 32(10): 1031004.