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用于红外焦平面阵列非均匀性校正的辐射参考源

Reference Source for Non-uniformity Correction of the Infrared Focal Plane Arrays

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摘要

概述了4 种红外焦平面阵列非均匀性过程中使用到的参考源。成为产品前,通常使用面源黑体作为参考源对红外焦平面阵列进行非均匀性校正;在热成像系统应用中动态非均匀性校正中,普遍使用的辐射挡板由于没有连有控温装置,只能进行一点校正,在场景温度偏离校正温度时,校正效果会受到影响;美国第三代前视红外成像系统中使用连有热电制冷器的热电参考源,利用热电制冷器对发射表面进行控温,可实现两点校正算法;为基于边框的SBNUC 校正算法设计的U 型边框黑体光阑,对视场中心没有遮挡,利用半导体制冷器对U 型边框黑体光阑的进行控温,能根据场景信息自适应地实现的两点校正。

Abstract

This paper introduced four reference sources used for reference-based non-uniformity correction of the infrared focal plane arrays. A surface blackbody is commonly used to perform non-uniformity correction in thermal imaging systems, and further correction can be performed during the process of using. The radiation shield is widely used in thermal imaging systems. It initially executes one-point correction without temperature control device. When the scene temperature deviates from the calibration temperature, the calibration results will be affected. The third generation imaging system exploits thermoelectric thermal reference sources (TTRS) with a thermoelectric cooler (TEC) which is used to control the temperature of the flat emitter substrate to achieve two-point calibration. The virtual perimeter diaphragm strips is designed for two-point non-uniformity correction algorithm along the rim. It only blocks the edge of the whole field of view (FOV) without covering the central FOV and uses the temperature control device to control the temperature of the rim, and realizes adaptive two-point calibration.

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中图分类号:TN219

所属栏目:材料与器件

收稿日期:2012-05-15

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金明磊:北京理工大学光电学院,“光电成像技术与系统”教育部重点实验室北京 100081
金伟其:北京理工大学光电学院,“光电成像技术与系统”教育部重点实验室北京 100081
刘崇亮:北京理工大学光电学院,“光电成像技术与系统”教育部重点实验室北京 100081
范永杰:北京理工大学光电学院,“光电成像技术与系统”教育部重点实验室北京 100081

备注:金明磊(1986-),男,博士研究生,主要从事红外图像处理和红外视频处理方面的研究。

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引用该论文

JIN Ming-lei,JIN Wei-qi,LIU Chong-liang,FAN Yong-jie. Reference Source for Non-uniformity Correction of the Infrared Focal Plane Arrays[J]. Infrared Technology, 2012, 34(7): 383-388

金明磊,金伟其,刘崇亮,范永杰. 用于红外焦平面阵列非均匀性校正的辐射参考源[J]. 红外技术, 2012, 34(7): 383-388

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