强激光与粒子束, 2012, 24 (12): 2911, 网络出版: 2013-01-14
材料表面处理用强流电子回旋共振离子源
Electron cyclotron resonance ion source for material surface treatment
电子回旋共振离子源 微波窗 表面处理 引出系统 electron cyclotron resonance ion source microwave window surface treatment surface treatment extraction system
摘要
介绍一台2.45 GHz永磁强流电子回旋共振离子源,其外径160 mm,高90 mm,放电室直径70 mm,高50 mm。微波馈入采用介质耦合方式,微波窗由一块50 mm×10 mm柱形BN和两块30 mm×10 mm的柱形陶瓷构成。离子源工作在脉冲模式下,采用三电极引出系统,最高引出电压达到100 kV,在微波输入功率300 W、进气量0.4 mL/min时,可引出峰值超过30 mA的氮离子束,在距离离子源引出孔1200 mm位置处的束流均匀区直径大于200 mm。
Abstract
A 2.45 GHz electron cyclotron resonance ion source with permanent magnets has been developed. Its outline dimension is 160 mm in diameter and 90 mm in height, the discharge chamber’s dimension is 70 mm in diameter and 50 mm in hehight. The microwave window is made of a 50 mm×10 mm BN disk and two 30 mm×10 mm ceramic disks. This ion source adopts a three-electrode extraction system and works in the pulsed mode. When the microwave input power is 300 W, the air inflow is 0.4 mL/min, a more than 30 mA peak current of the nitrogen beam can be extracted from a 5 mm emission aperture at 100 kV extraction voltage. The diameter of the beam uniform area on the working plane is more than 200 mm.
明建川, 郭之虞, 彭士香. 材料表面处理用强流电子回旋共振离子源[J]. 强激光与粒子束, 2012, 24(12): 2911. Ming Jianchuan, Guo Zhiyu, Peng Shixiang. Electron cyclotron resonance ion source for material surface treatment[J]. High Power Laser and Particle Beams, 2012, 24(12): 2911.