中国激光, 2013, 40 (2): 0216001, 网络出版: 2013-02-04
用于光刻机照明均匀化的微柱面镜阵列设计 下载: 568次
Design of Micro-Cylindrical-Lens Array Used for Illumination Uniformization in Lithography Systems
几何光学 微柱面镜阵列 光学设计 照明均匀性 geometric optics micro-cylindrical-lens array optical design illumination uniformization
摘要
均匀照明是投影光刻机中实现光刻线条高度均一性的重要条件。采用微透镜阵列作为照明匀光器件,能够在实现矩形照明光斑的同时获得极高的远场分布均匀性。基于微透镜阵列现有的加工工艺,设计出二维方向分开的柱面微透镜阵列,并通过优化设计,克服了微透镜之间的接缝在远场光场处产生的中心亮线。仿真分析表明,所设计的微透镜阵列的远场分布不均匀性达到0.85%。
Abstract
Uniform illumination is an important condition for maintaining high uniformization consistence of lithography lines in projection lithography. Micro-lens array used as the illumination uniformization component can make the rectangular illumination spot as well as acquire high far field uniformization. Based on modern processing technology, the cylindrical micro-lens array divided in two-dimension is designed, and the central bright line in the far field created by the transition area between the micro-lens array is eliminated. Simulation results show that the far field non-uniformi of the designed micro-lens array reaches 0.85%.
肖艳芬, 朱菁, 杨宝喜, 胡中华, 曾爱军, 黄惠杰. 用于光刻机照明均匀化的微柱面镜阵列设计[J]. 中国激光, 2013, 40(2): 0216001. Xiao Yanfen, Zhu Jing, Yang Baoxi, Hu Zhonghua, Zeng Aijun, Huang Huijie. Design of Micro-Cylindrical-Lens Array Used for Illumination Uniformization in Lithography Systems[J]. Chinese Journal of Lasers, 2013, 40(2): 0216001.