中国激光, 2013, 40 (7): 0707003, 网络出版: 2013-06-09   

不同基底上HfO2/SiO2多层膜的力学性能

Mechanical Properties of HfO2/SiO2 Thin Films on Different Substrates
作者单位
1 中国科学院上海光学精密机械研究所强激光材料重点实验室, 上海 201800
2 中国科学院大学, 北京 100049
摘要
用电子束蒸发技术在K9玻璃及YAG晶体上沉积了HfO2/SiO2多层膜,采用纳米划痕仪对薄膜的力学性能进行了研究。实验结果表明:沉积在YAG和K9的多层膜弹性模量分别为34.8 GPa和38.5 GPa, 基底对薄膜的弹性模量影响较小;YAG和K9上薄膜的粘附失效临界附着力分别为5 mN和7 mN,薄膜与YAG基底的结合状态较K9基底的差,并且呈现不同破坏模式。从薄膜之间及膜基界面处的界面结合状态和弹性模量两方面分析解释了YAG基底和K9基底上薄膜的不同力学行为。
Abstract
The HfO2/SiO2 films are deposited on K9 glass and Y3Al5O12 (YAG) crystal substrates by electron beam technology respectively. Nano-scratch tests are taken to investigate the mechanical properties of films respectively. The results show that the modulus of the films deposited on K9 and YAG are 34.8 GPa and 38.5 GPa respectively and the substrates have few effect on the elasticity modulus of the films. The adhesive force of the film is 7 mN on K9 substrate and 5 mN on YAG, and they present different failure modes. This can be attributed to the weak adhesion and large divergence of modulus between film and YAG crystal. The chemical binding state and elasticity modulus between the film and the substrate are taken to explain the different mechanical behaviors of the films on YAG and K9 substrates.

王河, 贺洪波, 张伟丽. 不同基底上HfO2/SiO2多层膜的力学性能[J]. 中国激光, 2013, 40(7): 0707003. Wang He, He Hongbo, Zhang Weili. Mechanical Properties of HfO2/SiO2 Thin Films on Different Substrates[J]. Chinese Journal of Lasers, 2013, 40(7): 0707003.

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