红外技术, 2013, 35 (6): 345, 网络出版: 2013-08-01   

电阻阵列非均匀性测试与校正

Resistor Array Nonuniformity Measurement and Correction
作者单位
第二炮兵工程大学精确制导与仿真实验室, 陕西 西安 710025
摘要
电阻阵列红外图像投射器的研究在近 20年间取得了突破性的进展。作为红外图像生成系统的关键部件,电阻阵列的非均匀性是影响红外图像质量的主要因素,电阻阵列在使用之前必须进行非均匀性校正才能满足红外图像生成系统的应用要求。给出了非均匀性校正的流程;针对稀疏网格法和全屏测试法的互补性,提出了改进的全屏测试法;采用 3次样条插值和分段线性法进行数据处理;采用“在线查表法”进行实时非均匀性校正。仿真结果表明,改进的全屏测试法及非均匀性实时算法取得了良好的效果。
Abstract
The research on resistor array based on infrared (IR) projectors has been greatly improved during the recent 20 years. As the key device of the infrared scene generation system, the resistor array’s nonuniformity is the main impact factor on the performance of the infrared image, and it must be corrected before used in order to satisfy the need of the infrared scene generation system. The nonuniformity correction flow is investigated in detail; the improved flood measurement is proposed to complement sparse grid and flood approach; the data-processing based on cubic spline interpolation and piecewise linearization is introduced; the real-time nonuniformity correction based on “online look-up-tables” is proposed. The simulation shows that the methods achieve excellent results.

杨春伟, 廖守亿, 苏德伦, 张金生, 王仕成. 电阻阵列非均匀性测试与校正[J]. 红外技术, 2013, 35(6): 345. YANG Chun-wei, LIAO Shou-yi, SU De-lun, ZHANG Jin-sheng, WANG Shi-cheng. Resistor Array Nonuniformity Measurement and Correction[J]. Infrared Technology, 2013, 35(6): 345.

本文已被 5 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!