为了实现对薄膜和镀层材料厚度的微区无损分析, 利用多毛细管X光会聚透镜和多毛细管X光平行束透镜设计并搭建了普通实验室X射线光源的共聚焦微束X射线荧光测厚仪, 对该共聚焦测厚仪的性能进行了系统表征。 利用该测厚仪测定了厚度约为25 μm的Ni独立薄膜样品和压于硅基表面厚度约为15 μm的Ni薄膜样品厚度, 对应它们的相对测量误差分别为3.7%和6.7%。 另外, 还对厚度约为10 μm Ni薄膜样品的厚度均匀性进行了测量。 该共聚焦测厚仪可以对样品进行微区深度分析, 并且具有元素分辨能力, 从而使得该谱仪可以测量多层膜样品不同层的膜厚, 在薄膜和镀层厚度表征领域具有潜在的应用。

A confocal micro X-ray fluorescence thickness gauge based on a polycapillary focusing X-ray lens, a polycapillary parallel X-ray lens and a laboratory X-ray source was designed in order to analyze nondestructively the thickness of thin film and cladding material. The performances of this confocal thickness gauge were studied. Two Ni films with a thickness of about 25 and 15 μm respectively were measured. The relative errors corresponding to them were 3.5% and 7.1%, respectively. The thickness uniformity of a Ni films with a thickness of about 10 μm was analyzed. This confocal technology for measuring the thickness was both spatially resolved and elemental sensitive, and therefore, it could be used to measure the thickness of the multilayer sample and analyze the thickness uniformity of the sample. This confocal thickness gauge had potential applications in analyzing the thickness of sample.