激光与光电子学进展, 2013, 50 (11): 111403, 网络出版: 2013-10-20  

激光诱导等离子体加工石英微通道的实验与理论研究

Research on the Fabrication of Micro Channels in Fused Silica Substrates by Laser-Induced Plasma
作者单位
1 贵州师范学院物理与电子科学学院, 贵州 贵阳 550018
2 贵州大学贵州省光电子技术与应用重点实验室, 贵州 贵阳 550025
摘要
利用调Q的Nd:YAG激光器输出的1064 nm纳秒脉冲激光聚焦在石英上采用激光诱导等离子体法加工微通道,加工出的微通道在显微镜下没有观察到热裂纹,通道深度可达4 mm。强激光辐照石英,石英吸收激光能量气化、电离,形成等离子体,发生光学击穿,高温等离子体烧蚀石英形成微通道。研究了强激光辐照下等离子体形成的机理以及介电常数、折射率、反射率等光学性质,分析了光学击穿的关键自由电子密度,并计算了光学击穿长度。
Abstract
A Q-switched Nd:YAG laser is used to fabricate micro channels in a fused silica substrate by laser-induced plasma processing. The interior wall of the micro channels drilled by laser-induced plasma is smooth, and the depth of the channel is up to 4 mm. High-power laser beam focused on the fused silica can lead to optical breakdown, resulting from the formation of plasma. The ablation of the high temperature plasma can lead to a micro channel. We study the ionization mechanism of optical breakdown in solids by nanosecond laser pulses. The changes of optical parameters, including dielectric function, reflectivity and refraction index, are studied. We also discuss the critical free electron density of optical breakdown and calculate the range of optical breakdown.

李世雄, 白忠臣, 陈德良, 秦水介. 激光诱导等离子体加工石英微通道的实验与理论研究[J]. 激光与光电子学进展, 2013, 50(11): 111403. Li Shixiong, Bai Zhongchen, Chen Deliang, Qin Shuijie. Research on the Fabrication of Micro Channels in Fused Silica Substrates by Laser-Induced Plasma[J]. Laser & Optoelectronics Progress, 2013, 50(11): 111403.

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