基于抛光所引起的熔石英元件表面、亚表面所存在的损伤前驱体分布，研究了不同种类的损伤前驱体所引起的损伤形貌。然后根据不同种类的损伤前驱体分别采用表面活性剂、强氧化性酸、氢氟酸的水溶液对不同的损伤前驱体进行处理。研究结果显示: 经过前期预先清洗以后，吸收性杂质所导致的雾状损伤得以消除，亚表面分布的裂纹得以很好地平滑钝化，极大地提升了熔石英光学元件的抗损伤性能，损伤阈值从4.8 J/cm2提高到11.0 J/cm2,最大提升幅度达到原来的2.3倍。

The laser damage precursors in fused silica were systematically isolated and identified. The paper shows laser damage micrographs from different precursors which are formed during fabrication. Conventionally polished and subsequently scratched fused silica plates were treated by submerging in various HF-based etchants (HF, or NH4F and HF at various ratios and concentrations) under different process conditions. With the optimized etch process, laser damage resistance increased dramatically; the average threshold fluence for damage initiation for fused silica increased from 4.8 to 11.0 J/cm2.