对KDP晶体旋转涂膜过程中的技术问题进行了探讨，包括元件夹持安全性、膜层均匀性、膜层透射比、膜层疏水性能、膜层激光损伤阈值等。分析了晶体元件加速旋转阶段的受力情况，明确了KDP晶体元件在旋涂操作过程中受力状态的安全性。对不同溶剂体系的膜层均匀性进行了判断，在400 mm尺寸的元件上获得了透射比均匀性为0.3%的减反膜。对溶胶进行稳态剪切流变分析得知，在现有的涂膜转速 (对应剪切速率100~200 s-1)范围内，其粘度随着剪切速率的增加几乎不变，近似牛顿流体。在旋涂过程中，处于基底不同位置的溶胶的粘度大致相等，这是影响膜层均匀性的重要原因之一。膜层疏水性能较好，水接触角测试结果大于152°。在SiO2基底上制备的减反膜，1053 nm处透射比大于99.8%。在熔石英基片上制备的三倍频减反膜样品的激光损伤阈值约为10 J/cm2(355 nm, 3 ns)。

The KDP crystal antireflective coatings prepared by spin coating method were discussed. The coating was modified using hexamethyl disilazane (HMDS), and had good moisture-resistant property. Some technique problems such as clamping safety during the spin process were analysed. The coating uniformity, the transmittance, moisture-resistant property and the laser induced damage threshold (LIDT) were measured. The transmittance ununiformity of the coating was about 0.3%, the transmittance at 1053 nm was over 99.8%, the water contact angle was over 152°, and the LIDT was about 10 J/cm2 (355 nm, 3 ns).