微结构的表面形貌会显著地影响微纳器件的使用性能及产品质量，是微纳测试领域的一个重要研究方面，利用白光干涉技术是测量物体表面形貌的一种常见方法。区别于常用的CCD黑白相机，使用CCD彩色相机采集白光干涉条纹的彩色图像，使获取的图像包含了R、G、B三个通道的信息。利用小波变换法分别求解出在不同扫描位置处R、G、B通道的相位信息，通过建立的评价函数，并结合最小二乘法可精确确定零光程差的位置，利用相对高度和零光程差位置的线性关系，进而得到物体的表面形貌。通过仿真以及实际测量由VLSI标准公司制造的标准台阶结构，验证了所提出方法的有效性。

Microstructure surface topography is a key aspect of micro-nano measuring research for it has an obvious influence on the performance and quality of micro-nano devices. White light interferometry is a common method of testing surface profiling. A color CCD camera, rather than a black-and-white CCD camera, is utilized to acquire white light interference images, which contain information of RGB channels. Based on acquired color interference images, wavelet transform method is employed to calculate phase value of corresponding channel in each scanning position. Then zero-optical-path-difference positions are accurately determined via a constructed evaluation function and least square method. Surface topography is eventually obtained via linear relationship between the relative height and the zero-optical-path-difference position. The proposed method is verified by simulation and experiment of measuring standard step provided by VLSI Standards Incorporated.