光子学报, 2014, 43 (1): 0116002_CLJ, 网络出版: 2021-08-31
掺钕磷酸盐激光玻璃除水工艺
Dehydration Processing in Nd3+-doped Phosphate Laser Glass
掺钕磷酸盐激光玻璃 钕离子 反应气氛法 除水工艺 OH基 界面反应 荧光寿命 Nd3+-doped phosphate laser glass Neodymium ions Reaction atmosphere process Dehydration processing OH Groups Interface reaction Fluorescence lifetime
摘要
利用反应气氛法除水工艺制备了组成为64P205-5.9A12O3-7.1K2O-19BaO-4.0Nd203(Wt%)的掺钕磷酸盐激光玻璃,研究了O2+POCl3、O2+SOCl2两种除水剂的除水效率及同一除水剂在不同除水时间、除水温度、通气流量下对掺钕磷酸盐激光玻璃荧光寿命的影响.结果表明:POCl3的除水效率优于SOCl2;通气最初阶段除水速率最快,且提高除水温度有利于消除水分,但受熔炼设备和工艺的影响,1 200℃进行除水更为合适;延长除水时间、增大通气流量都有助于提高除水效率;玻璃除水反应效率主要受OH基与除水剂界面反应的影响;荧光寿命随着除水时间的延长而增加,最后趋于一个稳定值;通气流量存在最佳值,实验中通气流量为0.8 L/min时较好.
Abstract
Nd3+-doped phosphate laser glass with the composition of 64P205-5.9A12O3-7.1K2O-19BaO-4.0Nd203 (Wt%) was prepared by means of reaction atmosphere dehydration process. The dehydration efficiencies of O2+POCl3 and O2+SOCl2 were studied, and the influence of identical dehydrator on the fluorescence lifetime of the prepared Nd3+-doped phosphate laser glass with different dehydration time, dehydration temperature and bubbling flux were also analyzed. The results showed that the dehydration efficiency of POCl3 overmatches SOCl2; the dehydration rate is the fastest at the initial bubbling stage, dehydration temperature raising benefits eliminating moisture; but it′s more appropriate to dehydrate under 1 200℃ due to influence from smelting equipment and process; prolonging the dehydration time and increasing the bubbling flux are beneficial to improving dehydration efficiency; dehydration efficiency of glass is mainly influenced by the interface reaction between OH and dehydrator; fluorescence lifetime is increased with the extension of the dehydrate time and it tends to a stable valve finally; there is an optimum value for bubbling flux that is 0.8litres every minute in the experiment.
曹亮军, 于天来, 邱红, 莫大洪, 王兆宁. 掺钕磷酸盐激光玻璃除水工艺[J]. 光子学报, 2014, 43(1): 0116002_CLJ. CAO Liang-jun, YU Tian-lai, QIU Hong, MO Da-hong, WANG Zhao-ning. Dehydration Processing in Nd3+-doped Phosphate Laser Glass[J]. ACTA PHOTONICA SINICA, 2014, 43(1): 0116002_CLJ.