为了实现光刻胶表面形貌的广域、高精度测量，对新一代测量理论及测量方法进行了研究。首先分析了被测物件的特性，根据其柔软、透明的特征提出应用光干涉法和机械探针相结合的方法进行测量，同时阐明了使用此方法进行表面形貌测量的优点，并据此原理搭建了光学多探针表面形貌测量装置，光学测量部分采用白光干涉计，探针部分采用拥有8只球型探头的多点悬臂测量探针。然后应用此装置对标准刻槽试件和半透明光造型薄膜试件进行了测量。测量52 nm的标准刻槽试件时得到了测量误差小于2%，标准偏差小于1 nm的结果，表明本装置可以达到高精度测量表面形貌的目的。通过测量高约400 nm的树脂材料证实了此装置可以克服多重反射的影响测量透明薄膜的表面形貌。

In order to realize a high-precision and wild area measurement for the surface profile of photoresist, we studied on a new measurement method. First, based on the physical properties of soft thin film, we proposed a method combining white light interferometer with mechanical ball cantilever to measure the surface profile. Then using this system, we did the measurement experiments on the notch and transparent material. The results show that for the notch, the precision of the system's measuring error is less than 2% and the measuring standard deviation is less than 1 nm, indicating that it is possible to measure the surface with high accuracy. For the transparent material, it shows that with this system the effect of multiple reflection on profile measurement can be overcome.