讨论了现有各种点阵全息光刻系统的基本原理。提出了一种基于衍射光栅和空间光调制器数字微反射器(DMD)的点阵全息光刻系统和方法。实现了飞行曝光加工方式，相比现有的步进曝光方式，其加工效率和定位精度获得了大幅度的提升。基于频域分析理论讨论了影响所述光刻系统的分辨率、图形质量和焦深的主要因素。阐述了在该光刻系统中实现飞行曝光加工方式的基本原理。

The working principle of the modern dot-matrix hologram lithography systems is discussed. A novel optical scheme based on the diffraction grating and high performance spatial light modulator——digital micro-mirror device (DMD) is proposed. Based on the optical scheme, a flash-on-fly working mode is realized. A much higher manufacturing efficiency and positioning precision is obtained compared with the traditional step-and-repeat working mode. The main influencing factors of the optical resolution, imaging quality and depth of focus are discussed based on the frequency domain analysis. The implementation of the flash-on-fly exposure mode is illustrated at the end.