中国激光, 2014, 41 (s1): s116001, 网络出版: 2014-07-03  

光刻物镜压力双膜片轴向调节机构优化设计

Optimization Design for Bi-Membrane Pressure Axial Adjusting Mechanism of Lithograph Objective
作者单位
中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室, 吉林 长春 130033
摘要
针对光刻物镜对镜片间隔调节精度高、范围大的需求,提出一种利用气体压差提供驱动力的压力双膜片轴向调节机构。并对该轴向调节机构的不同膜片宽度、厚度以及凸台宽度进行优化分析,在特定压力范围内得到调节机构的优化尺寸参数,分析调节机构在优化后的固有频率。同时分析在轴向调节过程中引入的镜片面形误差,得到镜片面形的Zernike系数。结果表明该压力双膜片轴向调节机构的镜片面形误差主要为power项和球差项,面形峰谷(PV)值优于13.45 nm,均方根(RMS)值优于2.851 nm,满足光刻物镜对调节机构镜片面形的要求。
Abstract
A bi-membrane axial adjusting mechanism is designed to meet the requirement of high precision and long distance in projection objective. The mechanism uses pressure for driving force. And optimization of different widths and thicknesses of diaphragms and width of the convex. It is optimized to gain the optimization parameters at certain pressure range. And then the frequency of mechanism is checked. The figure error of lens is analyzed to gain the Zernike coefficient when the mechanism is moving. The result indicates that the main figure error is power and sphere. The peak-to-valley (PV) of the low surface figure is better than 13.45 nm, and the root-mean-square (RMS) is better than 2.851 nm. The axial adjusting mechanism satisfies the requirement of lithograph projection objective.

孙振, 张德福, 华洋洋. 光刻物镜压力双膜片轴向调节机构优化设计[J]. 中国激光, 2014, 41(s1): s116001. Sun Zhen, Zhang Defu, Hua Yangyang. Optimization Design for Bi-Membrane Pressure Axial Adjusting Mechanism of Lithograph Objective[J]. Chinese Journal of Lasers, 2014, 41(s1): s116001.

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