中国激光, 2014, 41 (7): 0716001, 网络出版: 2014-05-30   

光参量放大晶体拼接机构设计及拼接误差补偿

Design of Optical Parametric Amplification Crystal Tiling Structure and Its Tiling Error Compensation
作者单位
1 中国工程物理研究院激光聚变研究中心, 四川 绵阳 621900
2 重庆大学机械工程学院, 重庆 400030
摘要
晶体拼接技术能够克服光参量啁啾脉冲放大(OPCPA)过程中非线性晶体口径受限问题,从而有效地提高放大器的输出能力。针对晶体拼接中相位匹配角的精确控制和晶体加工误差补偿问题,提出了“独立调整+误差补偿”的OPCPA晶体拼接技术方案,研制了2×2晶体拼接调整机构及2×2能动反射镜,每块子晶体可以进行3个自由度旋转以达到初始拼接角和相位匹配的目的,纳米精度的压电致动器驱动的2×2能动反射镜对晶体加工误差进行补偿。利用透射式元件对晶体拼接系统进行了可行性和稳定性验证,取得了较好的实验结果,证明该拼接调整方案是可行的。
Abstract
Crystal tiling technology is a good way to solve the problem of nonlinear crystal aperture limit in the process of optical parametric chirped pulse amplification (OPCPA), which can improve the output ability of the amplifier effectively. To solve the problem of precise control of the phase matching angle and the crystal machining error compensation in crystals tiling, a OPCPA crystal tiling method composing of the adjustsment independent and the error compensation is proposed. A 2×2 array crystal tiling adjustment structure and a 2×2 active array mirrors are designed. Each sub-crystal can be rotated three degrees of freedom to achieve the purposes of initial adjustment tiling angle and phase matching. 2×2 active array mirrors which are driven by nanometer accuracy piezoelectric actuators are used to compensate the cutting error of the tiling crystals. An experiment is conducted to test the feasibility and stability of the crystal tiling system using transmission elements and get good results. The result indicates that the crystal tiling technology is practical.

闫威, 张军伟, 吴文龙, 王逍, 母杰, 李志林, 粟敬钦, 林东晖. 光参量放大晶体拼接机构设计及拼接误差补偿[J]. 中国激光, 2014, 41(7): 0716001. Yan Wei, Zhang Junwei, Wu Wenlong, Wang Xiao, Mu Jie, Li Zhilin, Su Jingqin, Lin Donghui. Design of Optical Parametric Amplification Crystal Tiling Structure and Its Tiling Error Compensation[J]. Chinese Journal of Lasers, 2014, 41(7): 0716001.

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