为了提高熔石英元件表面抗激光损伤阈值, 利用超声波辅助HF酸研究平滑光学元件表面缺陷形貌和去除刻蚀后残留物效果, 通过扫描电子显微镜电镜和原子力显微镜记录表面形貌结构, 以及单脉冲激光辐照测试抗损伤阈值确定实验参数。研究表明, 超声波场的引入能催化HF酸的刻蚀速率、提高钝化效果并且更易剥离嵌入的亚μm级杂质粒子。经过实验测试, 获得了熔石英类元件相匹配的超声辅助HF酸刻蚀实验参数, 研究结果对应用超声波辅助HF酸研究熔石英表面抗激光损伤有重要意义。

In order to improve the laser damage resistance of fused silica optical surfaces, the appearance of smoothed fused silica surface defect and the effect of wiping off etching contamination are researched on HF-based etching processes under ultrasonic. And the experimental parameters are determined with SEM microscopy and atomic force microscopy to record face appearance and with one pulse laser incidence to measure laser damage threshold. Results show that it is advantageous to use HF-based etching processes under ultrasonic to smooth the defected surfaces and wipe off micrometer contamination particles. By experimental measurement, the parameters of HF-based etching processes under ultrasonic are obtained for different kinds of fused silica optics. The present research is very important for improving laser damage resistance of fused silica.