光学学报, 2015, 35 (6): 0611003, 网络出版: 2015-05-28  

投影物镜偏振像差对光刻成像质量影响的解析分析方法

Analytical Analysis Method for Impact of Polarization Aberration of Projection Lens on Lithographic Imaging Quality
沈丽娜 1,2,3,*李思坤 1,2王向朝 1,2闫观勇 1,2
作者单位
1 中国科学院上海光学精密机械研究所, 上海 201800
2 中国科学院大学, 北京 100049
3 新疆师范大学物理与电子工程学院, 新疆 乌鲁木齐 830000
摘要
提出一种分析线性偏振照明条件下投影物镜偏振像差对交替相移掩模(Alt-PSM)空间像影响的解析方法。基于矢量光刻成像理论,从掩模空间像的光强分布推导出偏振像差引起的空间像图形位置偏移误差(IPE)和最佳焦面偏移(BFS)的解析表达式,实现了各个泡利-泽尼克偏振像差对空间像影响的解析分析。建立了IPE 与奇像差项泡利-泽尼克系数和BFS 与偶像差项泡利-泽尼克系数间的线性关系。通过光刻仿真软件模拟验证了解析分析结果的正确性,并用最小二乘法评估了线性关系的精确度。
Abstract
An analytical analysis method for the impact of polarization aberration of projection lens on aerial image of alternating phase-shift mask (Alt-PSM) is proposed. Analytical expressions of image placement error (IPE) and best focus shift (BFS) caused by polarization aberration are derived. Analytical analysis for effect of every Pauli- Zernike polarization aberration to aerial image is realized. The linear relationships between IPE and odd items of Pauli-Zernike polarization aberrations, as well as that between BFS and even items of Pauli- Zernike polarization aberrations are established. The validity of analytical results is verified by numerical simulations, and the accuracy of linear relationships is assessed by the least square method.

沈丽娜, 李思坤, 王向朝, 闫观勇. 投影物镜偏振像差对光刻成像质量影响的解析分析方法[J]. 光学学报, 2015, 35(6): 0611003. Shen Lina, Li Sikun, Wang Xiangzhao, Yan Guanyong. Analytical Analysis Method for Impact of Polarization Aberration of Projection Lens on Lithographic Imaging Quality[J]. Acta Optica Sinica, 2015, 35(6): 0611003.

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