光电工程, 2015, 42 (6): 50, 网络出版: 2015-07-10   

光刻投影物镜中X-Y向柔性调节机构设计

Designing for Flexure-based X-Y Adjusting Mechanism of Lithograph Projection Objective
作者单位
中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室, 长春 130033
摘要
X-Y向柔性调节机构应用于光刻投影物镜中光学元件 X-Y方向偏心位置补偿。基于柔性铰链, 设计柔性二级减速机构, 并将之应用到新型的一体式 X-Y向柔性调节机构上。在对机构原理进行分析的基础上, 对 X-Y向柔性调节机构结构参数进行了优化设计。进一步, 运用有限元分析法, 分析了该 X-Y向柔性调节机构的性能。分析结果表明, 该机构调节行程大于 ±20 μm, 机构位移输入.输出关系稳定, 传动比约 11.9, 理论调节精度约 8.4 nm, 机构单方向驱动刚度为 0.473 μm/N; 机构开环单轴运动时, 耦合误差与主运动比值为 7.1%; 机构 1阶模态频率大于 200 Hz。该 X-Y向柔性调节机构能够应用到光刻投影物镜中。
Abstract
The flexure-based X-Y adjusting mechanism is applied in lithograph projection objectives to compensate the eccentric position of the optical elements in X-Y direction. Based on flexible hinges, two-stage flexible deceleration mechanism is designed. Further, making use of the two-stage flexible deceleration mechanism, a flexure-based X-Y adjusting mechanism which is new and of one part is created. Based on the analysis of the principle of the mechanism, structural parameters of the flexure-based X-Y adjusting mechanism are optimized. Moreover, using finite element method, performance of the flexure-based X-Y adjusting mechanism is studied. The results showed that the adjusting stroke is greater than ±20 μm, the displacement input-output relationship of the mechanism is steady, the transmission ratio is 11.9, the theoretically regulation accuracy is about 8.4 nm, the single-direction drive stiffness is 0.473 μm/N, and the ratio of coupling error and the main movement is 7.1%, when the mechanism moves open-loop and single-axis, and the first modal frequency is greater than 200 Hz. The flexure-based X-Y adjusting mechanism can be used in lithograph projection objective.

陈华男, 郭抗, 张玲花, 刘健, 尚红波. 光刻投影物镜中X-Y向柔性调节机构设计[J]. 光电工程, 2015, 42(6): 50. CHEN Huanan, GUO Kang, ZHANG Linghua, LIU Jian, SHANG Hongbo. Designing for Flexure-based X-Y Adjusting Mechanism of Lithograph Projection Objective[J]. Opto-Electronic Engineering, 2015, 42(6): 50.

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