光学学报, 2015, 35 (s1): s131001, 网络出版: 2015-07-27
退火时间对AZO薄膜结构及光学性质的影响
Effects of Annealing Time on the Structure and Optical Properties of Aluminum-Doped Zinc Oxide Thin Films
薄膜 AZO薄膜 磁控溅射 微观结构 表面形貌 紫外-可见透射 Thin films AZO thin films magnetron sputtering microstructure surface topography UV-Vis transmittance
摘要
采用直流磁控溅射方法,以K9玻璃为衬底制备掺铝氧化锌(ZnO:Al,AZO)薄膜。在300℃真空条件下对样品进行退火处理,研究不同退火时间对薄膜内部微观结构、表面形貌及光学特性的影响。结果表明,最佳退火时间为2 h,此条件下的AZO薄膜具有较强的(002)衍射峰,晶粒尺寸为17.2 nm,表面结构平整致密,紫外-可见波段的平均透射率为93.47%,光学带隙为3.41 eV。
Abstract
Aluminum-doped Zinc Oxide (ZnO:Al, AZO) thin films are deposited on K9 glasses by the DC magnetron sputtering. The deposited samples are annealed under the condition of vacuum and 300℃. Effects of annealing time on the microstructure, surface topography and optical properties of AZO thin films are researched, respectively. Results show that the optimal annealing time is 2 h. AZO thin films deposited under this condition has a stronger (002) diffracting peak with the grain size of 17.2 nm, and the surface microstructure is smooth and compact. The average transmittance of the sample in the UV-Vis band is 93.47%, and the corresponding optical energy gap is 3.41 eV.
侯海虹, 张涛, 王斌, 刘璐. 退火时间对AZO薄膜结构及光学性质的影响[J]. 光学学报, 2015, 35(s1): s131001. Hou Haihong, Zhang Tao, Wang Bin, Liu Lu. Effects of Annealing Time on the Structure and Optical Properties of Aluminum-Doped Zinc Oxide Thin Films[J]. Acta Optica Sinica, 2015, 35(s1): s131001.