为实现曝光系统均匀照明的目标，基于非成像光学，提出了一种阵列型模组的匀光照明系统优化设计方法。该方法首先通过对单模组的光学设计，实现半发散角度和阵列间距的初步计算，然后通过TracePro软件的Scheme宏语言和优化引擎相结合，实现对模组阵列间距的进一步优化，从而实现对整个光学系统的均匀照明设计。光源采用日亚紫外LEDSTS-DA1-2394E，阵列模组个数为5，阵列纵向间距为28 mm，横向间距为24 mm。该光学系统通过TracePro软件模拟仿真和实验结果表明：在距光源300 mm的距离处，可实现目标面积上的均匀照明，其非均匀性均小于5%，准直角度约为4°。

To achieve the target of uniform illumination of exposure system, a design method of uniform lighting system with array module is proposed based on non-imaging optics. Firstly, through the design of single lens, the half divergence and the array distance are calculated roughly.Secondly, the Scheme macro language and the optimization engine in TracePro software are used in combination to achieve the optimization of the array distance. And then, the design of uniform illumination of entire optical system can be realized. In this paper, the STS-DA1-2394E (Cat.No.130319) UV LED of Nichia′s is used as the light source, and the number of array module is 5. The array distance of lateral and vertical is respectively 28 mm and 24 mm. The results of simulation by TracePro software and experimental show that non-uniformity and collimation angle are less than 5% and 4° respectively, at a distance of 300 mm from the light source.