扫描干涉场曝光(SBIL)在制作大尺寸、纳米精度的衍射光栅中有着独特的优势。为了充分了解SBIL 系统的技术特点，介绍了国内外SBIL 技术的发展现状，并针对SBIL 系统中的各个关键技术进行技术性的调研与总结，着重分析了各关键技术已有解决方法的基本原理、优点以及存在的局限性，结合具体的光栅应用要求，给出了各关键技术的相应具体指标，展望了其发展趋势。

Scanning beam interference lithography (SBIL) is advantageous to produce large-area linear diffraction gratings that are phase-accuracy to nanometer level. In order to comprehend the merits of SBIL, the research progress on SBIL both in China and abroad are introduced, and the key technologies in SBIL are summarized from the merits and limitation of the scheme and principle. And then for the application of the specific grating, parameters of the key technologies in SBIL are presented. The development of SBIL is forecasted.