液晶与显示, 2015, 30 (5): 784, 网络出版: 2015-11-30
薄膜晶体管液晶显示器阵列工艺最终关键尺寸测试方法研究
Final critical dimension measuring method about TFT-LCD array process
最终关键尺寸 测试方法 扫描电子显微镜 补偿值 final inspection critical dimension measurement method scanning electron microscope compensation
摘要
最终关键尺寸是评价薄膜晶体管液晶显示器产品性能的一项重要参数。本文研究了在光源照度变化的条件下得到准确的最终关键尺寸的方法。通过大量的实验测试、数据分析,并配合扫描电子显微镜(SEM)图片,确定最终关键尺寸合适的测试条件和方法。基于上述分析,选取测量值稳定的光照强度区间中心点的光照强度作为标准样品参照值,选取此时样品测试图片作为标准图片。测试结果与SEM结果进行对比,得到不同膜层测量值和真实值之间的补偿值。并通过不同尺寸产品的数据收集和分析来验证补偿值的可靠性。通过上述方法,可以极大地缩短最终关键尺寸测量的校正周期,并为今后新产品开发提供可靠的测试标准。
Abstract
Final inspection critical dimension (FICD) is an important parameter to evaluate the performance of thin film transistor liquid crystal display (TFT-LCD) products. The method to obtain an accurate FICD data was studied in this paper. By a large number of experimental data and the scanning electron microscope (SEM) images,test conditions and methods were determined. Based on the above analysis,the center of illumination intensity which could provide stable measuring results was selected as the reference value,and the image was collected as golden sample simultaneously. By contrasting the above results and SEM results,the compensation value of the different layers between measured value and true value were obtained. Also the reliability was proved by data analysis of different sizes of products. As a result,calibration period of FICD measurement could be reduced greatly,and reliable test standard was provided for future products.
刘耀, 陈曦, 张小祥, 刘晓伟, 李梁梁, 丁向前, 郭总杰, 袁剑峰. 薄膜晶体管液晶显示器阵列工艺最终关键尺寸测试方法研究[J]. 液晶与显示, 2015, 30(5): 784. LIU Yao, CHEN Xi, ZHANG Xiao-xiang, LIU Xiao-wei, LI Liang-liang, DING Xiang-qian, GUO Zong-jie, YUAN Jian-feng. Final critical dimension measuring method about TFT-LCD array process[J]. Chinese Journal of Liquid Crystals and Displays, 2015, 30(5): 784.