针对大面积衍射光学元件制作过程中对光刻胶均匀涂覆的困难，研究弯月面均匀涂胶方法。利用沟槽型弯月面涂胶机，分析影响光刻胶厚度和厚度均匀性的因素。从实验上验证了光刻胶的胶厚和涂覆扫描速率的正相关关系。分析了光刻胶的浓度、基片与涂覆器刀口间隙、供胶速率等因素对胶厚及胶厚均匀性的影响。利用非接触式的激光微位移传感器监测基片和涂覆器刀口间隙，控制此间隙的抖动小于15 μm，优化系统运行的稳定性，提升了弯月面涂覆胶厚的均匀性，实现了胶厚峰谷值偏差3%和标准偏差0.5%的均匀光刻胶涂覆，能够满足脉宽压缩光栅等制作过程中对光刻胶均匀涂覆的需求。

It is difficult to coat photoresist uniformly on large plates for diffraction optics component fabrication. The relationship between photoresist thickness and scan velocity is experimentally explored by a small meniscus coating applicator. Aside from the thickness, the distribution uniformity of the thickness is also important and is experimentally found it is mainly dependent on system stability. Firstly, the relationship between the thickness uniformity and the scan velocity is explored and optimized. Secondly, interspace variations during the scan process with different coating parameters are measured in situ using a non-contact laser triangulation sensor, it is limited to 15 μm in the scan process. Several variation reduction measures are adopted. After parameter optimization and system improvement, the photoresist is uniformly coated with a peak-to-valley (PV) value of 3% and a root-mean-square deviation of 0.5% to fabricate diffractive optic plates.