激光与光电子学进展, 2016, 53 (2): 021202, 网络出版: 2016-01-22
Mueller 矩阵成像偏振仪的误差标定和补偿研究 下载: 854次
Study on Calibration and Error Compensation of Mueller Matrix Imaging Polarimeter
测量 Mueller 矩阵成像偏振仪 标定 旋转波片法 傅里叶分析法 measurements Mueller matrix imaging polarimeter calibration rotating quarter-wave plate method Fourier analysis method
摘要
Mueller 矩阵成像偏振仪是测量材料和器件偏振特性的重要仪器,也是测量浸没光刻机偏振像差的检测仪器,该偏振仪由偏振态产生器和偏振态分析器组成。其组成中的λ/4 波片相位延迟量误差及其快轴方位角误差与偏振片透光轴的方位角误差是影响Mueller 矩阵成像偏振仪测量精度的主要误差源。通过对本课题组研制的Mueller 矩阵成像偏振仪中5 个主要误差因素进行标定和补偿,显著提高了其测量精度。利用傅里叶分析法获得各项傅里叶系数,并根据各个误差与傅里叶系数的关系,实现了这些误差的标定,即达到对Mueller 矩阵成像偏振仪误差标定的目的。根据标定出的误差大小对Mueller 矩阵成像偏振仪进行了补偿。实验结果表明,通过对器件参数误差标定和补偿,Mueller 矩阵成像偏振仪的测量精度由0.2015 提高到0.1051,提高了47.84%。最后用该Mueller 矩阵成像偏振仪对一个物镜系统的偏振像差进行了测量,重复测量精度达到了1.1%。
Abstract
Mueller matrix imaging polarimeter is an effective instrument in measuring the polarization characteristics of materials and devices as well as the polarization aberration of immersion lithography tool, which is composed by polarization state generator and polarization state analyzer. The retardance and fast axis alignmen in the quarter-wave plates and the alignment error in polarizer are the main factors in influencing the measurement accuracy of the Mueller matrix imaging polarimeter. We measure the five primary parameter errors of the Mueller matrix imaging polarimeter of our laboratory developed. The measurement accuracy can be significantly enhanced. The calibration and compensation are carried out by Fourier analysis method. The experiment results show that the measurement accuracy of Mueller matrix imaging polarimeter has been increased from 0.2015 to 0.1051, which is 47.84% better than the un-calibrated one. At last, we measure the polarization aberration of projector with the calibrated Mueller matrix imaging polarimeter. The measurement repeatability is better than 1.1%.
李建慧, 郑猛, 张雪冰, 李艳秋. Mueller 矩阵成像偏振仪的误差标定和补偿研究[J]. 激光与光电子学进展, 2016, 53(2): 021202. Li Jianhui, Zheng Meng, Zhang Xuebing, Li Yanqiu. Study on Calibration and Error Compensation of Mueller Matrix Imaging Polarimeter[J]. Laser & Optoelectronics Progress, 2016, 53(2): 021202.