研究了微透镜阵列加工误差对光学系统成像性能的影响规律，寻求利于改善光学性能的面形误差分布。对面形误差与波前像差之间的转换矩阵进行建模，使仿真与计算的波前像差达到纳米级的误差精度，选用具有正交性的Zernike 多项式作为光学和机械的接口，表示加工后光学表面的面形误差，并分别作为干涉图数据引入到已设计的子眼透镜表面，量化分析不同位置下畸变、点列图、点扩展函数(PSF)、调制传递函数(MTF)的改变情况。分析结果表明相同形状分布下，面形精度峰谷(PV)值对光学系统畸变和MTF 的影响呈现递变规律，并且点扩展函数的二维分布与视场位置存在明显的对应关系；相同面形精度下，向左和中心对称分布的面形误差使得畸变、点列图和MTF 在一定相对位置得到改善，而降低了其他相对位置的光学性能。综合考虑各光学参数的变化情况，向右对称分布的面形误差分布对于改善光学系统成像性能有利，为实现成像质量的可控超精密加工制造提供了理论基础。

Influence of manufacturing errors of micro lens array on optical imaging performance is discussed to quest what distributive surface errors may benefit the improvement of optical performance. Transformation matrix between surface error and corresponding wavefront aberration is established, which achieves high deviation accuracy between simulated and computed wavefront aberrations. Zernike polynomials with orthogonality are utilized as the interface between optics and manufacturing, representing the surface error and wavefront aberration of the finished optical surface with the slow slide servo, acting as the interferogram data imported into the designated surface of 7 sub eye optical system afterwards, thus reflecting the change of distortion, spot diagram, point spread function (PSF) and modulation transfer function (MTF) at different locations quantitatively. Results show that errors with the same distribution but gradually increasing peak-valley (PV) values make the distortion and MTF change with gradient, and two-dimensional distribution of PSF has a remarkable correspondence with field; left and middle distributive wavefront aberrations with the same PV value improve the distortion, spot diagram and MTF at specific relative locations, but worsen optical performance at other locations. With overall consideration of various optical parameters, right distributive surface error benefits the improvement of optical performance, which provides surface shape compensation model for ultra-precision manufacturing process of freeform optics.