利用考夫曼离子源辅助电子束蒸发(IBAD)在K9 玻璃上制备了HfOsub>2 薄膜。采用DX-2000 型X 射线衍射仪(XRD)对薄膜晶体结构进行分析得知制备的薄膜呈现单斜晶相结构。采用SE850 宽谱变角度反射式光谱型椭偏仪对薄膜在280~2500 nm 波段的椭偏参数进行测量，光谱拟合中考虑了界面层和表面粗糙层，分别采用Cauchy 模型、Tauc-Lorentz 模型、Forouhi-Bloomer 模型、Sellmeier-Transparent 模型进行分析，得到薄膜紫外至近红外波段光学参数。椭偏拟合结果表明Tauc-Lorentz 模型最符合HfO₂ 薄膜光学特性，光谱曲线的拟合值与理论值最接近，均方根误差(MSE)为0.57。利用Lumda950 分光光度计测量薄膜透射率并计算出HfO₂薄膜光学带隙(~5.40 eV)。

HfO₂ thin films are deposited on K9 glass by Kaufman ion source assisted electron beam evaporation. The X-ray diffraction (XRD) results show that the films presented monoclinic phase. Spectroscopic ellipsometer SE850 is used to test elliptic partial parameters in 280~2500 nm waveband，and Cauchy index model, Tauc-Lorentz model, Forouhi-Bloomer model, Sellmeier-Transparent model are used to analyze the ellipsometric data with considering rough surface layer and interface layer, and optical parameters are obtained from ultraviolet (UV) to near-infrared (NIR) band. The fitting results show the Tauc-Lorentz model is the best model to describe the HfO₂ film optical properties (MSE 0.57). Thin films transmittance are measured by Lumda 950 spectrophotometer and HfO₂ films optical band gap are calculated (~5.40 eV).