强激光与粒子束, 2016, 28 (4): 044002, 网络出版: 2016-04-01  

硅双极器件及电路电离总剂量辐照损伤研究

Research of total ionizing dose effects in silicon bipolar devices and circuits
作者单位
1 中国电子科技集团公司 第四十七研究所, 沈阳 110032
2 西安电子科技大学 宽带隙半导体技术国家重点学科实验室, 西安 710071
3 中国电子科技集团公司 第十三研究所, 石家庄 050051
摘要
针对硅双极器件及其构成的双极集成电路有着如低剂量率辐照损伤增强效应等不同于其他类型电路的特殊的辐照响应问题,分析了空间辐射电离总剂量环境及铝屏蔽作用,双极晶体管及电路总剂量辐照损伤机理,低剂量率辐照损伤增强效应、规律和电参数变化。通过选取几种典型的双极晶体管和电路进行地面辐照模拟试验和测试,证明了双极器件及电路的关键参数受辐照影响较大,特别是对低剂量率辐照损伤增强效应敏感,低剂量率辐照损伤增强因子基本都大于1.5,不同双极器件和电路的低剂量率辐照损伤增强效应有着明显的不同,与器件类型、加工工艺(如氧化层厚度)等密切相关。
Abstract
As silicon bipolar devices and circuits have different radiation effects from other types of circuits, such as enhanced low dose rate sensitivity, this article analyzes the space radiation environment, Al shield effect, the total ionizing dose radiation damage mechanism and the principle, rule, and electrical parameters change by enhanced low dose rate radiation sensitivity of bipolar devices and circuits. The radiation experiment in lab with several typical bipolar devices and circuits indicates that the important parameters of the bipolar devices and circuits are greatly influenced by total ionizing dose radiation, especially by low dose rate radiation, with the enhancement factors of low dose rate radiation mostly more than 1.5.Different bipolar devices and circuits have different enhanced low dose rate sensitivity, which is mainly due to device types and manufacture process (such as oxidation layer thickness).

王鹏, 崔占东, 邹学锋, 杨筱莉. 硅双极器件及电路电离总剂量辐照损伤研究[J]. 强激光与粒子束, 2016, 28(4): 044002. Wang Peng, Cui Zhandong, Zou Xuefeng, Yang Xiaoli. Research of total ionizing dose effects in silicon bipolar devices and circuits[J]. High Power Laser and Particle Beams, 2016, 28(4): 044002.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!