针对光电极值法和石英晶振法各自的弊端，结合两种方法提出了光控-晶控膜厚监控法.在相同工艺条件下，分别使用这三种方法监控905 nm窄带滤光片（规整膜系）和830 nm截止滤光片（非规整膜系）的膜厚，对制备的滤光片的透射率光谱曲线进行比较.结果表明，光控-晶控膜厚监控法除了各项指标都符合要求外，在曲线通带处获得的平均透过率值比光电极值法和石英晶振法获得的平均透过率值提高了3%～6%，且与理论光谱基本吻合，光谱特性最好.该方法不仅对规整和非规整膜系都能进行监控，且能有效降低膜厚误差，提高光谱特性.

According to the disadvantages of both photoelectric extreme value and quartz crystal oscillation methods, a combination method based on photoelectric and quartz control were presented. To evaluate the performance of the combination method, the films with coating thickness of 905 nm narrow band filter (quarter wave coatings) and 830nm cutoff filter (non-quarter wave coatings) were monitored using the combination method and individual method respectively under the same process. The combination method shows better performance, compared to the case of using an indiviual method. From the spectral transmittance curves of filters, the average transmittance values in the pass bands increase by 3%～6% by using the combination method. Meanwhile, the transmittance curve achieved by the combination method consists well with the theoretical spectral curve. The results show that this method can not only monitors quarter wave coatings and non-quarter wave coatings, but also effectively reduce the monitoring error and improve the spectral characteristics.