用脉冲直流磁控溅射方法在硅片衬底上制备了厚度相同的单层钼薄膜，结合台阶仪、X射线衍射仪、场发射扫描电镜、原子力学显微镜和紫外-可见分光光度计分别研究了不同沉积速率对钼薄膜微结构、表面形貌和光学性能的影响。掠入射X射线反射谱拟合的钼薄膜厚度与设计厚度一致，说明当前钼薄膜制备工艺成熟稳定。沉积速率通过改变薄膜生长模式与薄膜形核率影响钼薄膜表面形貌演化。随着沉积速率的增大，薄膜越来越致密，钼(110)面的衍射峰强度逐渐增大，平均晶粒尺寸增大, 表面粗糙度先降低后增加。

Monolayer Mo films with the same thickness are deposited on the Si substrates by direct current pulse magnetron sputtering method. The influence of different deposition rates on the microstructure, morphology and optical properties of Mo films is investigated with stylus surface profiling system, X-ray diffractometer, field emission scanning electron microscopy, atomic force microscopy and ultraviolet-visible spectrophotometer, respectively. The Mo film thickness fitted by grazing incidence X-ray reflective spectra agrees well with the designed thickness, which indicates that the current process technology of Mo film is mature and stable. The morphology evolution of Mo films is affected by the deposition rate via altering the growth model and nucleation rate of Mo films. As the increase of deposition rate, the density, diffractive intensity of Mo (110) and average grain size of films increase, whereas the surface roughness decreases first and then increases.