半导体光电, 2016, 37 (6): 800, 网络出版: 2016-12-30  

单晶硅表面金字塔微结构反射特性的研究

Research on Reflection Properties of Monocrystalline Silicon Surface with Pyramids Microstructure
作者单位
南京航空航天大学 理学院, 南京 210016
摘要
通过对化学腐蚀法制备的单晶硅表面微结构进行分析, 建立了一种金字塔微结构的数学模型, 采用时域有限差分法(FDTD)数值计算了波长在300~1000nm范围内微结构表面反射率随波长的变化规律, 并将计算结果与实验测量结果进行了比较、分析和解释。在此基础上, 针对不同实验条件下所形成的金字塔微结构差异, 数值计算了几种不同参数金字塔结构表面的反射率随波长的变化规律。研究表明, 反射率随金字塔的占空比和倾角的增大而减小, 而金字塔尺寸变化对反射率的影响较小。当金字塔的结构参数为底边长2μm、占空比1、倾角约60°时减反效果较好, 平均反射率仅为6.28%。
Abstract
Monocrystalline silicon surface microstructure prepared by chemical etching was analyzed and a mathematical model of pyramids microstructure was established. The reflectance of microstructure surface in the range of 300~1000nm was calculated by using the finite difference time domain method (FDTD). Numerical results were first compared with the experimental results, then analyzed and explained. Based on this, considering the pyramids microstructure parameters are different due to the changes of experimental conditions, the surface reflectance of several kinds of pyramids with different parameters in a range of wavelength was calculated by FDTD. The analysis shows that the reflectance tends to reduce as the duty ratio and the dip angle of the pyramids increase, while the pyramids scale has little effect on the reflectance. As the bottom length is equal to 2μm, duty ratio is equal to 1 and dip angle is about 60°, the effect of anti-reflection is so preferably that the average reflectance is as low as 6.28%.

黄鑫, 韩明珠, 蒋孝鑫, 杨雁南. 单晶硅表面金字塔微结构反射特性的研究[J]. 半导体光电, 2016, 37(6): 800. HUANG Xin, HAN Mingzhu, JIANG Xiaoxin, YANG Yannan. Research on Reflection Properties of Monocrystalline Silicon Surface with Pyramids Microstructure[J]. Semiconductor Optoelectronics, 2016, 37(6): 800.

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