光电工程, 2016, 43 (12): 72, 网络出版: 2016-12-30  

感光材料光谱灵敏度测定曝光系统的设计

Design of Exposure System for the Spectral Sensitivity Detection of the Photosensitive Material
作者单位
1 教育部光学仪器与系统工程研究中心,上海 200093
2 上海现代光学系统重点实验室,上海 200093
3 上海现代光学系统重点实验室,上海 20009
摘要
为了测定感光材料的光谱灵敏度,通过Code V、SolidWorks 软件优化设计了一套感光材料光谱灵敏度测定曝光系统。分析比较了在不同入射角、不同光栅线数情况下系统光路结构的差异,确定入射角25°、光栅线数为350 L/mm 是系统的最优设计。实验结果表明,设计的曝光系统能够产生一个宽201.5 mm,高80 mm,覆盖360nm~900 nm 光波长的矩形光谱,经过一个18 等级台阶的灰度片使得光谱功率能在0.52 mW~10.65 mW 之间进行调节,光谱分辨率能够达到0.021 nm,满足曝光系统的设计要求。
Abstract
To measure the spectral sensitivity of the photosensitive material, an exposure system for the spectral sensitivity detection of the photosensitive material is designed by use of commercial software of Code V and SolidWorks. The structural differences of the optical path are analyzed using line density of grating under diverse incident angle. The analysis result is that the incident angle of 25° and line density of 350 L/mm are optimum parameters of the exposure system. The experimental result in the system shows that the rectangular spectra of the size of 201.5 mm×80 mm can be achieved, the wavelengths cover the range of 360 nm~900 nm, the intensity of spectra can be adjusted in the range of 0.52 mW?10.65 mW when an 18 gray scale level of slices are inserted in the exposure system, and the resolution of spectra is 0.021 nm, which satisfies the requirement of the exposure system.

孙乐, 黄元申, 盛斌, 董成成, 周红艳, 张大伟. 感光材料光谱灵敏度测定曝光系统的设计[J]. 光电工程, 2016, 43(12): 72. SUN Le, HUANG Yuanshen, SHENG Bin, DONG Chengcheng, ZHOU Hongyan, ZHANG Dawei. Design of Exposure System for the Spectral Sensitivity Detection of the Photosensitive Material[J]. Opto-Electronic Engineering, 2016, 43(12): 72.

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