光学学报, 2017, 37 (2): 0222002, 网络出版: 2017-02-13
极紫外光刻动态气体锁抑制率的实验研究
Experimental Research on Suppression Ratio of Dynamic Gas Lock for Extreme Ultraviolet Lithography
光学制造 X射线光学 极紫外光刻 动态气体锁 抑制率 optical fabrication X-ray optics extreme ultraviolet lithography dynamic gas lock suppression ratio
摘要
开展了动态气体锁抑制率的实验研究,设计了一套极紫外真空动态气体锁实验验证系统;进行了真空抽气系统的详细设计,形成了具有实际可操作性的真空系统的最终布局;指出了该实验验证系统的验证方法;进行了动态气体锁实验,并对实验结果进行了分析,验证了动态气体锁理论模型和仿真结果的正确性。实验研究结果表明,当污染气体放气率恒定时,增加清洁气体总流量将使动态气体锁抑制率逐步增加;同等条件下动态气体锁抑制率不随污染气体放气率的改变而改变;当清洁气体总流量和污染气体放气率都恒定时,动态气体锁抑制率随清洁气体相对分子质量的增加而缓慢增加。该动态气体锁抑制率实验研究结果,能够为极紫外光刻机动态气体锁的研制提供实验依据。
Abstract
Experimental research on dynamic gas lock (DGL) suppression ratio is presented. Firstly, an experimental system of the extreme ultraviolet (EUV) vacuum DGL is designed; then the vacuum pumping system is designed detailedly, and the practical layout of the vacuum system is developed; moreover, the experimental steps are pointed out; finally the DGL experiments are carried out and results are analyzed to verify the theoretical model and simulation results of the DGL. Experimental results show that suppression ratio of the DGL increases gradually as the purge-gas flux increases when the dirty-gas outgassing is constant; suppression ratio of the DGL has nothing to do with the dirty-gas outgassing under the same conditions; and suppression ratio of the DGL increases slowly as the purge-gas molecular weight increases and the purge-gas flux and dirty-gas outgassing remain stable. The experimental research on DGL suppression ratio is helpful for the development of DGL in EUV lithography machine.
陈进新, 王宇, 谢婉露. 极紫外光刻动态气体锁抑制率的实验研究[J]. 光学学报, 2017, 37(2): 0222002. Chen Jinxin, Wang Yu, Xie Wanlu. Experimental Research on Suppression Ratio of Dynamic Gas Lock for Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2017, 37(2): 0222002.