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ICP刻蚀优化及在多波长分布反馈式激光器阵列中的应用

Parameter Optimization of Inductively Coupled Plasma and Its Application on Multi-Wavelength DFB Laser Array

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摘要

研究了CH4/H2/Cl2感应耦合等离子体刻蚀技术中的关键工艺参数对刻蚀性能的影响。通过对CH4/H2/Cl2气体流量及流量比的优化,在自行设计的InP/InGaAlAs多量子阱结构的外延片上,实现了一种高速低损耗、形貌良好的Bragg光栅制作方法。基于优化后的工艺参数制作了多周期结构的λ/4相移光栅,实现了单片集成的四波长1.3 μm分布反馈式激光器阵列。该激光器阵列中激光器的阈值电流典型值为11 mA,外微分效率可达0.40 W/A,且实现了边摸抑制比大于46 dB的稳定的单纵模激光输出。研究结果表明优化后的ICP光栅刻蚀工艺具有良好的刻蚀精度和可靠性。

Abstract

The influence of the key process parameters of CH4/H2/Cl2 inductively coupled plasma (ICP) on the etching performance was systematically investigated. The flow density and the ratio in CH4/H2/Cl2 gas mixtures are optimized. Therefore, an effective method can be used for fabricating Bragg grating with high etching rate, low damage ICP etching and high quality surface on special designed InP/InGaAlAs multiple quantum well wafer. Combined with post-process, four wavelengths 1.3 μm distributed feedback laser array was fabricated based on multi-period λ/4 shifted Bragg grating. The typical threshold current and the external differential efficiency are about 11 mA and 0.40 W/A, respectively. And the side mode suppression ratio of each laser diode is more than 46 dB. It can be verified that ICP etching processing in Bragg grating has high quality and reliability.

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中图分类号:TN248.4

DOI:10.3788/lop54.031405

所属栏目:激光器与激光光学

基金项目:国家高技术研究发展计划(2015AA016901)

收稿日期:2016-08-31

修改稿日期:2016-11-18

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作者单位    点击查看

饶 岚:北京邮电大学电子工程学院, 北京 100876
忻向军:北京邮电大学电子工程学院, 北京 100876
李灯熬:武汉电信器件有限公司, 湖北 武汉 430074
王任凡:武汉电信器件有限公司, 湖北 武汉 430074
胡 海:深圳清华大学研究院, 广东 深圳 518000

联系人作者:饶岚(raolan@bupt.edu.cn)

备注:饶 岚(1979-),女,博士,讲师,主要从事通信光电子材料、器件与集成技术方面的研究。

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引用该论文

Rao Lan,Xin Xiangjun,Li Deng′ao,Wang Renfan,Hu Hai. Parameter Optimization of Inductively Coupled Plasma and Its Application on Multi-Wavelength DFB Laser Array[J]. Laser & Optoelectronics Progress, 2017, 54(3): 031405

饶 岚,忻向军,李灯熬,王任凡,胡 海. ICP刻蚀优化及在多波长分布反馈式激光器阵列中的应用[J]. 激光与光电子学进展, 2017, 54(3): 031405

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