Collection Of theses on high power laser and plasma physics, 2016, 14 (1): 198, Published Online: May. 26, 2017  

Stability of the Sol Gel Silica Antireflective Film Heat Treated at High and Low Temperature

Author Affiliations
1 中国科学院上海光学精密机械研究所高功率激光物理联合实验室,上海 201800
2 中国科学院大学,北京 100049
Abstract
The silica suspension was prepared by a sol gel method using tetraethylorthosilicate (TEOS) as precursor and ethanol as solvent. The stability of the sol system was observed by particle size test. The particle size maintained at about 6.5 nm for 4 months. The quartz substrates were coated by a dipping method and heat treated at 200 ℃ and 800 ℃ in a muffle burner. The film transmittance curve moves to short wavelength direction by about 210 nm, and both the transmittance peaks are more than 99.8%. Therefore, the film’ optical properties are excellent. The stabilities of film heat treated at different temperatures were researched in different humidity environments. The transmittances of the films heat treated at 200 ℃ are more than 99.9% and the wavelength of film transmittance peak decreases by about 150 nm. The transmittances of the films heat treated at 800 ℃ reduces by 0.3% and the wavelength of film transmittance peak maintain at 600 nm.

Shen Bin, Li Haiyuan, Xiong Huai, Zhang Xu, Tang Yongxing. Stability of the Sol Gel Silica Antireflective Film Heat Treated at High and Low Temperature[J]. Collection Of theses on high power laser and plasma physics, 2016, 14(1): 198.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!