针对环形抛光中抛光盘的面形难以精确控制的问题, 以Preston方程和Winkler假定为基础, 建立光学元件抛光的基本模型, 通过理论分析和计算机模拟与实验, 深入研究环形抛光的系统特性。结果表明, 系统存在一个保持盘面面形不变的状态, 此时的状态为系统的平衡状态, 在平衡状态下抛光工件时无需调整校正板位置即可连续获得高精度平面; 在不同的工况下, 系统平衡状态对应的校正板位置不相同, 应用建立的模型定量研究平衡状态下校正板位置与工件尺寸的关系。实验证明在平衡状态下抛光工件时工件的面形精度和加工效率都得到了提高。

Aiming at the problem that the surface shape of polishing pad in continuous polishing is difficult to control precisely, the basic model of optical element polishing is established based on Preston equation and Winkler assumption. Through theoretical analysis, computer simulation and experiment, system characteristics of the continuous polishing is studied further. The result shows that the system has a state that can keep the surface shape of the disk unchanged. The state of this situation is the equilibrium state of the system. It is possible to obtain the high precision plane continuously without adjusting the position of conditioning plate when the workpiece is polished in the equilibrium state. Under different working conditions, the position of the conditioning plate is different in the equilibrium state of the system. The relationship between the position of the conditioning plate and the size of the workpiece in the equilibrium state is quantitively studied by using established model. The experiments prove that the accuracy of workpiece surface shape and processing efficiency are improved when the workpiece is polished in equilibrium state.