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激光干涉光刻制备976 nm分布反馈式激光器光栅

Fabrication of Gratings Used in 976 nm Distributed Feedback Lasers Based on Laser Interference Lithography

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摘要

分布反馈式(DFB)半导体激光器具有优良的稳定性和单模性, 广泛应用于激光器抽运和光通信等领域。光栅作为DFB激光器的关键部件, 对激光器性能有重要的影响。针对976 nm波段设计制备了DFB激光器的光栅。基于耦合模理论优化设计光栅的结构参数, 采用激光干涉光刻和反应耦合等离子体(ICP)刻蚀技术制备光栅。通过引入表面镀膜SiO2的方法提高了光栅图形由光刻胶向衬底转移的保真度, 显著地改善了光栅的图形质量。探究了曝光时间、ICP刻蚀时间对光栅表面形貌的影响。实验结果表明, 所制备的光栅条纹分布均匀, 有较好的表面形貌, 满足预期设计目标。

Abstract

The distributed feedback (DFB) laser, featured in its stability and single-mode emission, is widely used in various domains such as pumping lasers and optical communications. As a key component in the DFB laser, the grating plays an important role in laser performance. The design and fabrication of the grating for the 976 nm DFB semiconductor laser are presented. The experiment starts with the optimization of the grating structure parameters based on the coupled mode theory. The gratings are fabricated through laser interference lithography and inductively coupled plasma (ICP) etching technique. The pattern quality of the fabricated grating is improved by the introduction of surface coating SiO2, and the fidelity of grating pattern transfer from photoresist to substrate is improved as well. Influence of exposure time and ICP etching time on grating surface morphology is investigated. The experiments show that the fabricated grating has uniformly distributed fringes and better surface morphology, and the expected design is realized.

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中图分类号:TN248.4

DOI:10.3788/lop54.120501

所属栏目:衍射与光栅

基金项目:长春理工大学青年科学基金(XQNJJ-2015-10)、长春理工大学科技创新基金(XJJLG-2016-07)、 吉林省科技计划重点项目(20150204068GX)

收稿日期:2017-07-18

修改稿日期:2017-08-30

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白云峰:长春理工大学高功率半导体激光器国家重点实验室, 吉林 长春 130022
范杰:长春理工大学高功率半导体激光器国家重点实验室, 吉林 长春 130022
邹永刚:长春理工大学高功率半导体激光器国家重点实验室, 吉林 长春 130022
王海珠:长春理工大学高功率半导体激光器国家重点实验室, 吉林 长春 130022
海一娜:长春理工大学高功率半导体激光器国家重点实验室, 吉林 长春 130022
田锟:长春理工大学高功率半导体激光器国家重点实验室, 吉林 长春 130022

联系人作者:范杰(fan576@163.com)

备注:白云峰(1991—), 男, 硕士研究生, 主要从事光电子技术及应用方面的研究。E-mail: bai_yun_feng@126.com

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引用该论文

Bai Yunfeng,Fan Jie,Zou Yonggang,Wang Haizhu,Hai Yina,Tian Kun. Fabrication of Gratings Used in 976 nm Distributed Feedback Lasers Based on Laser Interference Lithography[J]. Laser & Optoelectronics Progress, 2017, 54(12): 120501

白云峰,范杰,邹永刚,王海珠,海一娜,田锟. 激光干涉光刻制备976 nm分布反馈式激光器光栅[J]. 激光与光电子学进展, 2017, 54(12): 120501

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