光散射学报, 2017, 29 (4): 372, 网络出版: 2018-01-10
X射线激光干涉对晶体精密测量
Precise Measuring of Crystals by X-Ray Laser Apparatus Interference
摘要
基于X射线激光脉冲短、单色性好、能量高而且相干程度高的优点,本文从理论上提出X射线激光干涉用于对晶体结构及缺陷的测量。 由于X射线激光波长量级为10-10m,因此可实现高精密测量。此外,本文给出了X射线激光测量晶体的装置、缺陷晶体的测量模型和晶体参量的测量模型。
Abstract
Based on the advantages of short X-ray laser pulse,excellence monochromaticity,high energy and superior coherence,X-ray laser interferometry is proposed to measure crystal structures and defects in this paper.As the X-ray laser apparatus wavelength of the order of 10-10m,high-precision measurement can be realized.In addition,X-ray laser measurement of crystal devices system,defective crystal measurement model and crystal parameter measurement model are provided in this paper.
张超, 茆慧玲. X射线激光干涉对晶体精密测量[J]. 光散射学报, 2017, 29(4): 372. ZHANG Chao, MAO Huiling. Precise Measuring of Crystals by X-Ray Laser Apparatus Interference[J]. The Journal of Light Scattering, 2017, 29(4): 372.