为降低TFT-LCD生产过程中切换残影不良的发生率, 在考虑残影的主要影响因素基础上, 采用实验设计(DOE) 中的部分因子实验设计筛选该不良的显著因子, 结合生产实际开展切换残影的改善研究工作。研究结果表明: DOE方法能有效辨别残影不良的显著因子有覆盖层(Over coater, OC)、重叠部分(ITO-Vcom Overlay, OL)和摩擦扭转力(Rubbing Torque), 在实际生产的不良改善过程中, 彩膜玻璃(Color Filter, CF)增加OC、加大OL和提高Rubbing Torque值均能有效降低残影不良发生率; 研究结果为切换残影和改善TFT-LCD生产过程中其他不良提供了新思路。

To reduce the occurrence of TFT-LCD image-retention, several key factors were approved with fractional factorial design adopting the design of experiment (DOE). Through the practical production, we solved the problem about the image-retention. The results showed that the prominent factors of image-retention, including OC, OL and Rubbing Torque, can be effectively distinguished by DOE method. Moreover, by adding OC on CF,enlarging and ITO-Vcom Overlay, or increasing Rubbing Torque value, the incidence of image-retention during improvement can be effectively reduced. This study provided a new idea for other defect researches in image-retention and TFT-LCD production process.