为解决石英非球面微透镜阵列加工所面临的工艺可控性差且面型精度不高这两大难点，提出了一种基于车削掩模刻蚀的石英玻璃元件制作方法。该方法主要使用了单点金刚石车削加工技术与反应离子刻蚀技术，研究了掩模材料车削及刻蚀性能，并利用实验优选出掩模材料，最后进行了面积为5 mm×5 mm石英玻璃非球面微透镜阵列的制备。通过实验结果与预期参数进行对比，分析表明，该方法制作的石英玻璃元件误差均方根为1.155 nm，面型精度误差0.47%。

In order to solve the two difficult problems of the poor processing controllability and the low surface accuracy of quartz aspheric microlens array processing, a fabrication method of quartz aspheric microlens array for turning mask is proposed. This method mainly uses single point diamond turning technology and reactive ion etching technology, studies the turning and etching properties of the mask material, and optimizes the mask material by experiment. Finally, the fabrication of an aspherical glass microlens array with an area of 5 mm×5 mm was carried out. The experimental results are compared with the expected parameters. The analysis shows that the error root mean square of the quartz glass component is 1.155 nm, and the surface accuracy error is 0.47%.