随着我国电力技术的迅猛发展, 因电弧/电晕放电造成高压设备损坏、 高压线传输损耗的问题愈加引起重视。 完成了电弧/电晕目标在200～1 000 nm的光谱特性测量, 发现电弧电晕光谱强度分布主要集中在200～400 nm紫外波段。 提出了使用紫外面阵成像技术用于探测研究电弧/电晕的方法, 通过一套自制的紫外面阵成像系统, 成功实现了对高压电弧/电晕目标进行的实验室内紫外成像, 以及氙灯积分球辐射定标与目标反演。 实验结果表明, 该套紫外面阵成像系统可用于对电弧电晕放电进行实时检测。 该研究验证了电弧/电晕的紫外辐射特性, 在距离2 m处得到反演后的6 kV电弧的紫外240～280 nm波段的辐照度为3.39×10-5 W·cm-2, 为深入开展电弧/电晕的紫外特性研究提供强有力的依据。

With the rapid development of electric power technology, problems about high voltage equipment damage and high voltage line transmission loss caused by arc and corona discharge are increasingly paid more attention to. This paper has done the work about the measurement of arc and corona spectrum with its wavelength from 200 to 1 000 nm. We have found that the arc and corona spectrum intensity distribution is mainly concentrated on ultraviolet waveband, whose band is between 200 to 400 nm. This paper has proposed a way of using ultraviolet focal plane array imaging technology to detect arc and corona discharge. By means of using a set of self-built UV imaging system, wehave successfully got UV images about the targets of high voltage arc and corona in the laboratory, radiometric calibration by xenon lamp integrating sphere and target inversion. The result of experiments shows that this set of UV imaging system can be used on real-time detection for arc and corona discharge. This paper firstly verifies the ultraviolet features of arc and corona, and gets radiance of 5.4×10-6 W·cm-2·sr-1 of 6 kV arc in 240～280 nm ultraviolet band from the distance of 2 m by the means of target inversion, which provides strong supports for further study on the ultraviolet features of arc and corona.