光学学报, 2018, 38 (7): 0731002, 网络出版: 2018-07-16   

沉积工艺对YbF3薄膜可靠性的影响

Influence of Deposition Process on Reliability of YbF3 Thin Films
作者单位
1 中国科学院上海技术物理研究所,上海 200083
2 中国科学院大学,北京 100049
摘要
从沉积方式、薄膜厚度、沉积温度和离子束能量四个方面,研究了沉积工艺对氟化镱(YbF3)薄膜可靠性的影响。研究结果表明,相较于电阻加热蒸发方式,用电子束加热蒸发得到的YbF3薄膜,其致密性更好,水汽吸收更少;薄膜太厚或沉积温度太高会加大YbF3薄膜的应力,使薄膜表面出现裂痕,甚至使薄膜脱落;离子束辅助沉积可以增加YbF3薄膜的附着力,改善薄膜的表面质量;随着离子束能量的增加,薄膜的应力先增大后减小。根据以上研究结果得出YbF3薄膜的最佳沉积工艺,并研制出具有良好光谱性能和高可靠性的宽光谱增透膜。
Abstract
The influence of deposition process on the reliability of YbF3 films is studied from four aspects including deposition method, film thickness, substrate temperature and ion beam energy. The research results show that, in contrast to those by resistance heating evaporation, the films deposited by electron beam evaporation have a higher density and lower water-vapor absorption. When the film is too thick or the deposition temperature is too high, the stress of YbF3 film increases, which results in the occurrence of cracks on the film surface or the peeling of coatings. Ion-assisted deposition can enhance the adhesion of YbF3 films and improve the surface quality. As the ion beam energy increases, the stress of coatings first increases and then decreases. According to the above results, the optimal deposition process is obtained and a broadband anti-reflected coating with good optical properties and high reliability is produced.

冯毅东, 于天燕, 刘定权. 沉积工艺对YbF3薄膜可靠性的影响[J]. 光学学报, 2018, 38(7): 0731002. 冯毅东, 于天燕, 刘定权. Influence of Deposition Process on Reliability of YbF3 Thin Films[J]. Acta Optica Sinica, 2018, 38(7): 0731002.

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