红外与激光工程, 2018, 47 (6): 0618002, 网络出版: 2018-09-08   

浸没式光刻照明系统的照明模式变换器

Light mode converter in immersion lithography lighting system
李美萱 1,2,3,*董连和 3
作者单位
1 吉林工程技术师范学院 量子信息技术交叉学科研究院, 吉林 长春 130052
2 吉林省量子信息技术工程实验室, 吉林 长春 130052
3 长春理工大学,吉林 长春 130000
摘要
研究了NA1.35浸没式光刻照明系统中照明模式变换模块的设计和测试。采用衍射光学元件实现包括传统照明、二极照明、四极照明的照明模式变换系统的设计和分析。给出了不同照明模式的衍射光学元件的设计结果, 并对设计结果进行了模拟分析和实验分析, 证明了设计的可行性。研究结果表明: 当输入光场被分割的阵列数为20×20单元时, 二极和四极照明模式下衍射元件台阶数为32, 传统照明模式下台阶数为128的情况下, 衍射光学元件作为照明模式变换器的均匀性及衍射效率都能够满足设计要求。从原理、实验上验证衍射光学元件激光模式变换器设计的正确性及可行性。研究结果能够应用于浸没式光刻照明系统中照明模式变换结构中, 具有一定的理论价值和工程意义。
Abstract
The lighting mode convertor module in NA1.35 immersion lithography lighting system design has been designed and tested. The lighting mode convertor system can be realized by using diffractive optical element(DOE) in the design and analysis, including the traditional lighting mode, diode lighting mode and quadrupole lighting models. And then different lighting models of diffractive optical elements for the design results were presented. The results were simulated and the experimental results were analyzed, which proved the feasibility of the design. The research results show that when the input optical field is divided with the number of array of 20×20 units, the diode lighting and quadrupole lighting models of diffractive optical elements are with numbers of 32 steps, the traditional lighting mode of 128 steps, the uniformity of diffractive optical elements as lighting mode converters and the diffraction efficiency are able to meet the design requirements. From the basis principle, the experimental validation of diffractive optical elements correctness and feasibility of the laser mode converter design can meet the requirements. The results can be applied to the immersion lithography lighting mode convertors in the immersion lithography lighting system structure, which have the great certain theoretical value and engineering significance.

李美萱, 董连和. 浸没式光刻照明系统的照明模式变换器[J]. 红外与激光工程, 2018, 47(6): 0618002. Li Meixuan, Dong Lianhe. Light mode converter in immersion lithography lighting system[J]. Infrared and Laser Engineering, 2018, 47(6): 0618002.

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