中国光学, 2018, 11 (5): 745, 网络出版: 2018-11-25
浸没式光刻投影物镜光学薄膜
Optical calcoatings for projection objective immersion lithography
浸没式光刻 光学薄膜 膜系设计 环境适应性 激光辐照寿命 immersion lithography optical coatings coating system design environmental adaptability lifetime under laser irradiation
摘要
深紫外光刻是目前集成电路制造的主流方法, 为实现更小的元件特征尺寸, 必须采用浸没式投影物镜以提高光学系统的分辨率, 由此向其中的薄膜光学元件提出了众多苛刻的要求。本文介绍了适用于浸没式光刻系统的薄膜材料及膜系设计, 以及高NA光学系统所需的大角度保偏膜系; 对物镜中最关键的浸液薄膜的液体环境适应性、疏水及防污染等关键问题进行了讨论; 对衡量浸没式光刻系统性能的重要因素镀膜元件激光辐照寿命, 尤其是浸液环境下的元件辐照寿命进行了分析。
Abstract
The deep ultraviolet lithography is currently a main method for integrated circuit manufacture. The immersive projection objective must be used to increase resolution of the optical system for realization of smaller component feature dimensions. Therefore a number of rigorous requirements for optical coating component are put forward. In this paper we present designs of the film material and film system applicable to immersive lithographical system as well as the large angle polarization-maintaining film system required for optical systems at high NA. Key issues about immersion environment adaptability, hydrophobicity and anti-contamination of the immersion coating most critical to the objective are discussed. Laser irradiation lifetime of the coated components especially in the immersion environment that is an important factor to evaluate performance of the immersive lithographical system is analyzed.
毕丹丹, 张立超, 时光. 浸没式光刻投影物镜光学薄膜[J]. 中国光学, 2018, 11(5): 745. BI Dan-dan, ZHANG Li-chao, SHI Guang. Optical calcoatings for projection objective immersion lithography[J]. Chinese Optics, 2018, 11(5): 745.