选取Al2O3、AlF3两种材料, 采用双面拆分法在JGS1基底上完成了深紫外波段高反射, 近紫外到可见光波段高透射的全介质滤光膜的设计.研究了稳定控制AlF3蒸发速率的制备方法, 验证了离子源辅助沉积技术对镀膜材料在紫外波段吸收的影响, 建立了膜层厚度与电子束蒸发特性的函数关系, 借助软件模拟了误差的影响, 并结合工艺技术的改进, 有效提高了紫外光的利用率, 最终研制的滤光膜在200～270 nm平均反射率为77.96%, 在290～700 nm平均透过率为96.29%, 满足使用需求.

Using Al2O3 and AlF3, the high reflection in the deep ultraviolet band and the high transmission of the ultraviolet band to the visible band light was designed on the JGS1 substrate by the double-sided separation method. The preparation method of AlF3 evaporation rate is studied, and the influence of ion source assisted deposition technology on the absorption of coating materials in ultraviolet band is verified. The function relation between film thickness and electron beam evaporation features is established. The influence of the error is simulated with the help of the software. With the improvement of technology, the utilization rate of ultraviolet light is improved effectively. Finally, the average reflectivity of the filter film at 200～270 nm is 77.96%, and the average transmittance of 290～700 nm is 96.29%.