光子学报, 2018, 47 (12): 1214003, 网络出版: 2019-01-10
离子束刻蚀辅助飞秒激光加工制备碳化硅微光学元件
Ion Beam Etching Assisted Femtosecond Laser Machining to Manufacture Silicon Carbide Micro-optical Components
超快激光 半导体加工技术 离子束刻蚀 碳化硅 微光学元件 Ultrafast lasers Semiconductor device manufacture Ion beams etching Silicon carbide Micro-optical components
摘要
为了解决飞秒激光加工硬质材料所带来的表面质量差的问题, 提出了离子束刻蚀与飞秒激光复合加工技术.利用飞秒激光加工技术在碳化硅表面制备微纳结构图形, 然后通过离子束刻蚀技术对碳化硅微纳结构进行刻蚀, 以调控结构的线宽和深度, 使结构表面粗糙度由约106 nm降低到11.8 nm.研究表明, 利用该技术制备的碳化硅菲涅尔波带片展现出良好的聚焦和成像效果.
Abstract
A hybrid technology combined ion beam etching and femtosecond laser machining was proposed for solving the problem of high surface roughness when processing of hard materials by femtosecond laser machining. First, silicon carbide micro/nano structures were fabricated by femtosecond laser machining. Then, the silicon carbide micro/nano structures were etched by ion beam etching. Ion beam etching can adjust the width and depth of the line structure, and reduce the surface roughness of the structures from about 106 nm to 11.8 nm. The silicon carbide Fresnel zone plate prepared by this technology exhibits well focusing and imaging properties.
于磊, 杨双宁, 刘学青, 李德辉. 离子束刻蚀辅助飞秒激光加工制备碳化硅微光学元件[J]. 光子学报, 2018, 47(12): 1214003. YU Lei, YANG Shuang-ning, LIU Xue-qing, LI De-hui. Ion Beam Etching Assisted Femtosecond Laser Machining to Manufacture Silicon Carbide Micro-optical Components[J]. ACTA PHOTONICA SINICA, 2018, 47(12): 1214003.