光学学报, 2019, 39 (2): 0214001, 网络出版: 2019-05-10  

基态HF分子和介质消耗对重复频率脉冲HF激光输出的影响 下载: 886次

Influence of Ground-State HF Molecule and Medium Consumption on Output of Repetitively Pulsed HF Laser
作者单位
西北核技术研究所激光与物质相互作用国家重点实验室, 陕西 西安 710024
摘要
研究了氟化氢(HF)分子浓度以及工作介质消耗对激光脉冲能量的影响。受激光器内基态HF分子对激光的再吸收以及对激发态分子强弛豫的影响,激光脉冲能量随着激光器内HF分子浓度的升高而明显下降,HF分子浓度每增加1×10 15 cm -3,激光脉冲能量约下降1.15%。1个激发态HF分子约产生0.8个光子,放电区内SF6气体的分解率约为1%,单次放电过程中激光器内所消耗的工作介质较少,约为气体总量的1/(2×10 5)。实验结果表明:HF分子浓度对激光脉冲能量的影响较大,介质消耗对激光脉冲能量影响较小;通过在激光器内加入分子筛,可以将HF浓度控制在1.8×10 15 cm -3的水平。在两个因素的共同影响下,激光脉冲能量下降率约为10%。
Abstract
The influences of the concentration of HF molecular and the consumption of the working medium on the laser pulse energy are studied. The laser pulse energy decreases obviously with the increasing of the concentration of HF molecular in the laser, due to the reabsorption of the HF molecule on laser and the strong relaxation effect of the HF molecule on the excited molecules. The laser pulse energy decreases about 1.15% with the increasing of the concentration of HF molecular for 10 15 cm -3. In addition, each excited HF molecule can emit 0.8 photons, the dissociation rate of SF6 molecules in the discharge region is about 1%, and the consumption of the working medium is small for a single discharge process and the consumption is about 1/(2×10 5) of the total gas amount. The experimental results show that the laser pulse energy is affected seriously by the HF molecular concentration, but weakly by the medium consumption. With the add of the molecular sieves in the laser chamber, the HF molecular concentration is maintained at a level of 1.8×10 15 cm -3, and the laser pulse energy decreases about 10% under the coaction of two factors.

朱峰, 黄珂, 陶波, 黄超, 李高鹏, 沈炎龙, 栾昆鹏. 基态HF分子和介质消耗对重复频率脉冲HF激光输出的影响[J]. 光学学报, 2019, 39(2): 0214001. Feng Zhu, Ke Huang, Bo Tao, Chao Huang, Gaopeng Li, Yanlong Shen, Kunpeng Luan. Influence of Ground-State HF Molecule and Medium Consumption on Output of Repetitively Pulsed HF Laser[J]. Acta Optica Sinica, 2019, 39(2): 0214001.

引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!